| 90nm TFS versus other 90nm NVM technologies |
| High Area efficiency and reliability |
- Erase times 50-90% higher than TFS
- Floating gate bit cellus susceptible to charge loss when subject to even microscopic defects
|
- Very high-density arrays
- Unique nanocrystal charge storage technology provides unparalleled redundancy and reliability
|
| Lower stop and run currents |
- Read, program and erase down to ~2.0V
- 3x greater run current and 5-10x greater standby currents
|
- Read/program/erase down to 1.71V
- <1mA operation at low frequency
|
| EEPROM capability |
- No integrated EEPROM capability
- Off-chip EEPROM has slower erase + write times (5-10 msec)
- Off-chip EEPROM has lower endurance
|
- FlexMemory user-configurable as EEPROM and/or program flash
- Write time: ~100usec
- Erase + write time: 1.5ms
|
| Scalability |
- Area efficiency limited by cell construction
|
- Excellent area efficency (low-voltage charge pump for programming)
- Array and analog area efficiency allow cost-competitive low-and high-density products with single technology
|
| TFS is lower power, more area-efficient, more flexible and more scalable |