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Process Technology


Continuously Working to Perfect the Process

Freescale's process technologies drive innovation in the market, pushing the boundaries of higher-performing, lower-power devices in ever smaller packages. While technology scaling continues to be more and more expensive and technical challenging, the economics continue to yield every improving cost/function in end solutions. Freescale remains committed to an industry leading roadmap both in performance and breadth of technology offerings.


CMOS Technology

Freescale's high-performance CMOS process technology, known as HiPerMOS, is key for System-on-Chip (SoC) applications in the wireless, networking, transportation and home networking markets.

Embedded Memory Technology

Freescale's development of memory technologies and devices focuses on meeting specific requirements such as nonvolatility, faster read/write times, lower power consumption and reduced system complexity as compared to designing the same memory device off-chip. Recent advances include the first commercially-available MRAM device.


Gallium Arsenide (GaAs) MOSFET

Freescale has combined the high performance of gallium arsenide (GaAs) semiconductor compounds with the advantages of traditional metal oxide semiconductor field effect transistor (MOSFET) technology to create the industry's first commercially viable MOFSET device.

Inverted-T channel field effect transistor (ITFET)

Freescale's invention of the ITFET device broke through traditional CMOS scaling barriers and vertical multi-gate challenges to deliver the industry's first combination of vertical and planar tin body structures within a single transistor.


RF R&D

Freescale develops differentiating RF and enabling technologies that connect the analog and digital worlds.

Sensors

Freescale develops advanced sensing technology for detecting motion, tilt, liquid level, acceleration, pressure, smoke detection and more. Freescale is a leader in MEMS (Micro-Electro Mechanical Systems)-based sensors.


SMARTMOS™ Technology

Freescale’s proprietary SMARTMOS™ technology is bringing long battery life to wireless devices with SMARTMOS 10W and providing next-generation power management for automotive and industrial applications with SMARTMOS 10T.

Strained Silicon-on-Insulator (sSOI)

Offering the performance of SOI and the enhanced carrier mobility of strained silicon, sSOI transistors show performance increases greater than 30 percent over conventional technology and reductions of active power consumption of more than 40 percent.

Did you know?

  • Freescale Firsts:

    • Industry's first ultra-thin PDSOI solution for low power
    • Industry's first low K in production
    • Industry's first ultra low K solution (65nm)
    • Industry's first high K MIM technology for decoupling
    • Novel junction engineering for reduced FBE
    • Industry's first "rotated substrates"

Learn more

Want the technical details? Read our Technology Papers.

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